Citation:
Manhabosco TM, Mueller IL. Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques. JOURNAL OF MATERIALS SCIENCE. 2009;44:2931-2937.
Abstract:
In this study, thin cobalt films were electrodeposited directly onto n-Si (100) using two different electrodeposition techniques: galvanostatic and potentiostatic. The morphological difference between galvanostatic and potentiostatic deposits was observed by atomic force microscopy (AFM) and X-ray diffraction (XRD). Analysis of the deposits by an alternating gradient field magnetometer (AGFM) showed the influence of the electrodeposition process on the magnetic properties of the film.